About HS Code 851419
This HS code is highly specific, covering electric resistance-heated furnaces and ovens used in industrial or laboratory settings, *other than hot isostatic presses*, that are designed for the manufacture of semiconductor devices on semiconductor wafers. These specialized furnaces are fundamental to the microelectronics industry, performing critical processes like diffusion, oxidation, and annealing in a controlled environment. They are essential for creating the intricate layers and structures on silicon wafers that form integrated circuits. Major exporters are leading semiconductor equipment manufacturers, primarily from Japan, the USA, and Europe, while importers are the global semiconductor fabrication plants (fabs) in Asia and other regions. Key considerations include ultra-high purity environments, precise temperature uniformity, and integration into complex cleanroom production lines, reflecting the cutting-edge nature of semiconductor manufacturing.
Products Under This Code
Diffusion furnaces for wafers, Oxidation furnaces for semiconductors, Annealing furnaces for wafers, CVD furnaces for semiconductor devices, Rapid thermal processing (RTP) systems, Wafer processing ovens, Epitaxy furnaces
Real World Examples
Applied Materials PVD/CVD Furnaces, Tokyo Electron (TEL) Diffusion Furnaces, Lam Research Etch/Deposition Systems, Kokusai Electric Batch Furnaces, ASM International Epitaxy Furnaces
Common Misclassification
This code is highly specific for semiconductor manufacturing. General resistance furnaces fall under other 8514 codes, e.g., 851411 if a HIP, or 851430 for other types.
Products Classified Under 8514.19
Industry
This code belongs to the Electronics & Electrical Equipment industry.
Trade Overview
Japan, the USA, and Germany are top exporters; Taiwan, South Korea, and China are major importers due to their dominant semiconductor industries.
Frequently Asked Questions
What is HS code 851419?
HS code 851419 covers: Furnaces and ovens; electric, for industrial or laboratory use, resistance heated; other than hot isostatic presses, for the manufacture of semiconductor devices on semiconductor wafers. This HS code is highly specific, covering electric resistance-heated furnaces and ovens used in industrial or laboratory settings, *other than hot isostatic presses*, that are designed for the manufacture of semiconductor devices on semiconductor wafers. These specialized furnaces are fundamental to the microelectronics industry, performing critical processes like diffusion, oxidation, and annealing in a controlled environment. They are essential for creating the intricate layers and structures on silicon wafers that form integrated circuits. Major exporters are leading semiconductor equipment manufacturers, primarily from Japan, the USA, and Europe, while importers are the global semiconductor fabrication plants (fabs) in Asia and other regions. Key considerations include ultra-high purity environments, precise temperature uniformity, and integration into complex cleanroom production lines, reflecting the cutting-edge nature of semiconductor manufacturing.
What products fall under HS code 851419?
Diffusion furnaces for wafers, Oxidation furnaces for semiconductors, Annealing furnaces for wafers, CVD furnaces for semiconductor devices, Rapid thermal processing (RTP) systems, Wafer processing ovens, Epitaxy furnaces
What are common misclassifications for HS code 851419?
This code is highly specific for semiconductor manufacturing. General resistance furnaces fall under other 8514 codes, e.g., 851411 if a HIP, or 851430 for other types.
How is HS code 851419 structured?
HS code 851419 is a 6-digit subheading under the Harmonized System. The first 2 digits (85) identify the chapter, digits 3-4 (14) identify the heading, and digits 5-6 (19) specify the subheading. This code is standardized globally by the World Customs Organization.